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Fabrication of Molecularly Defined Surface Nanopatterns by
Electron Induced Chemical Lithography

A. Gölzhäuser*, a, W. Geyera, V. Stadlera, W. Ecka, M. Grunzea, Th. Weimannb, P. Hinzeb

aAngewandte Physikalsiche Chemie, Universität Heidelberg,
Im Neuenheimer Feld 256, 69120 Heidelberg, Germany

bPhysikalisch Technische Bundesanstalt,
Bundesallee 100, 38116 Braunschweig, Germany

This is an abstract for a presentation given at the
Eighth Foresight Conference on Molecular Nanotechnology.
There will be a link from here to the full article when it is available on the web.


The effective fabrication of chemically defined surface nanostructures is an important objective in fields such as molecular electronics, biochips or biosensors. A promising strategy towards this goal is the combination of well established "top-down" lithographic techniques with novel self-assembling materials.

Recently, we have found that electron irradiation converts the terminal nitro functionality of self-assembled monolayers (SAMs) of 4-nitrobiphenylthiol to an amino group, while the underlying aromatic layer is dehydrogenated and cross-linked [1,2]. Based on these results, we employed electron beam lithography to modify the terminal groups of specifically tailored aromatic SAMs so that molecules can directly bind to the exposed regions. This electron induced "chemical lithography" can create ultrahigh resolution (< 20 nm) templates for the site selective immobilization of molecules.

  1. W. Geyer, V. Stadler, W. Eck, M. Zharnikov, A. Gölzhäuser, M. Grunze, Appl. Phys. Lett. 75, 2401 (1999).
  2. W. Eck, V. Stadler, W. Geyer, M. Zharnikov, A. Gölzhäuser, M. Grunze, Adv. Mater. 12, 901 (2000).

*Corresponding Address:
Armin Gölzhäuser
Angewandte Physikalsiche Chemie, Universität Heidelberg,
Im Neuenheimer Feld 256, 69120 Heidelberg, Germany


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