Researchers at the Institute of Bioengineering and Nanotechnology (IBN) in Singapore have now successfully demonstrated, for the first time, a lithography-free, direct-write technique for fabricating discrete field-effect transistors, as well as digital logic gates on a single nanowire…
“Our single-step fabrication technique obviates the time-consuming and labor-intensive lithography process, and enhances the fabrication accuracy and yield,” says Roy. “With a higher level of precision and throughput, it can offer a powerful method for rapid prototyping of futuristic nanoelectronic circuits.”
I like that word “futuristic” and hope it’s not just a translation error. –Chris Peterson
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