Using proprietary block co-polymer technology, directed self-assembly allows adding block co-polymers that assemble themselves into regular arrays on the surface of a silicon wafer that had been patterned using lithography.
Using proprietary block co-polymer technology, directed self-assembly allows adding block co-polymers that assemble themselves into regular arrays on the surface of a silicon wafer that had been patterned using lithography.
MIT scientists have devised much more efficient procedures for modeling protein folding in order to be able to model the folding of the flood of proteins sequences made available by modern genome sequencing methods.
In a review of physicist and television host Michio Kaku’s latest book, Foresight advisor Glenn Reynolds finds reason for optimism, but also cause for concern in the career choices of today’s brightest minds.
UK scientists use mechanical force to manipulate silicon dimers on a silicon surface as a first step toward automated atomically precise manufacture of three-dimensional nanostructures.
Researchers in the UK and Japan use atomic force microscopy to visualize a DNA molecular robot moving along a 100-nm DNA track.
Will proposals to establish criteria for green nanotechnology foster growth of nanotechnology innovation?
A shear flow processing method has been developed to control the surface attachment and orientation of DNA molecules to use for DNA-organic semiconductor molecular building blocks.
A step toward advanced nanotechnology has been achieved by using attachment to a surface and confinement by surrounding molecules to make two molecules react to form a product that would not form if they were free to react in solution.
Computational work links optically-induced molecular shape change to change in DNA structure to extract useful work.
Sputtering a pattern of zinc atoms on a graphene surface, followed by an acid rinse to remove the zinc, also removes exactly one atomic layer of graphene from where ever the graphene was covered with zinc atoms, forming a pattern on the graphene surface that is atomically precise in the vertical dimension. Resolution in the horizontal dimensions is determined by the mask used to sputter zinc.
